- 2014年 - (計3報++)
“Physics on development of open-air atmospheric pressure thin film fabrication technique using mist droplets; control of precursor flow”
Toshiyuki Kawaharamura
Jpn. J. Appl. Phys., Vol.53 (2014) 05FF08 (7 pages) (10.7567/JJAP.53.05FF08)
“Influence of Substrates on Formation of Zinc Oxide Nanostructures by a Novel Reducing Annealing Method”
Xin Li, Chaoyang Li, Toshiyuki Kawaharamura, Dapeng Wang, Noriko Nitta, Mamoru Furuta, Hiroshi Furuta, and Akimitsu Hatta
Nanosci. Nanotechnol. Lett., Vol.6 (2014) pp.174-180 (10.1166/nnl.2014.1708)
“Mist Chemical Vapor Deposition of Aluminum Oxide Thin Films for Rear Surface Passivation of Crystalline Silicon Solar Cells”
Takayuki Uchida, Toshiyuki Kawaharamura, Kenji Shibayama, Takahiro Hiramatsu, Hiroyuki Orita, and Shizuo Fujita
Appl. Phys. Express, Vol.7 (2014) 021303 (4 pages) (10.7567/APEX.7.021303)
- 2013年 - (計5報)
“Enhancing carrier mobility of IGZO TFT fabricated by non-vacuum mist CVD with O3 assistanc”
Toshiyuki Kawaharamura, Takayuki Uchida, Dapeng Wang, Masaru Sanada and Mamoru Furuta
Physica Status Solidi (c), Vol.10 No.11 (2013) pp.1565-1568 (10.1002/pssc.201300247)
「ミストCVD法によるAlOx薄膜作製に対するO3支援の効果」
内田 貴之, 川原村 敏幸, 古田 守, 眞田 克
日本材料学会誌, Vol.62 No.11 (2013) pp.663-667
“Growth and electrical properties of AlOx grown by mist chemical vapor deposition”
Toshiyuki Kawaharamura, Takayuki Uchida, Masaru Sanada, Mamoru Furuta
AIP Advances, Vol.3 (2013) 032135 (9 pages) (10.1063/1.4798303)
“Effect of O3 and Aqueous Ammonia on Crystallization of MgO Thin Film Grown by Mist Chemical Vapor Deposition”
Toshiyuki Kawaharamura, Kazuharu Mori, Hiroyuki Orita, Takahiro Shirahata, Shizuo Fujita, and Takashi Hirao
Jpn. J. Appl. Phys., Vol.52 (2013) 035501 (5 pages) (10.7567/JJAP.52.035501)
“Stoichiometry Control of ZnO Thin Film by Adjusting Working Gas Ratio during Radio Frequency Magnetron Sputtering”
Chaoyang Li, Dapeng Wang, Zeming Li, Xin Li, Toshiyuki Kawaharamura, Mamoru Furuta
Journal of Materials, Vol.2013 (2013) 547271 (6 pages) (10.1155/2013/547271)
- 2012年 - (計6報)
“Fabrication of Silicon Oxide Thin Films by Mist Chemical Vapor Deposition Method from Polysilazane and Ozone as Sources”
Jinchun Piao, Shigetaka Katori1, Toshiyuki Kawaharamura, Chaoyang Li, and Shizuo Fujita
Jpn. J. Appl. Phys., Vol.51 (2012) 090201 (3 pages) (10.1143/JJAP.51.090201)
“Electrical Properties of the Thin-Film Transistor With an Indium-Gallium-Zinc Oxide Channel and an Aluminium Oxide Gate Dielectric Stack Formed by Solution-Based Atmospheric Pressure Deposition”
Mamoru Furuta, Toshiyuki Kawaharamura, Dapeng Wang, Tatsuya Toda, and Takashi Hirao
IEEE Electron Device Lett., Vol.33 (2012) pp.851-853. (10.1109/LED.2012.2192902)
“Development and Research on the Mechanism of Novel Mist Etching Method for Oxide Thin Films”
T. Kawaharamura and T. Hirao
Jpn. J. Appl. Phys., Vol.51 (2012) 036503 (5 pages) (10.1143/JJAP.51.036503)
“Successful growth of conductive highly-crystalline Sn-doped α-Ga2O3 thin films by fine channel mist chemical vapor deposition”
T. Kawaharamura, Giang T. Dang, and M. Furuta
Jpn. J. Appl. Phys., Vol.51 (2012) 040207 (3 pages) (10.1143/JJAP.51.040207)
“Photo-leakage current of TFTs with ZnO channels formed at various oxygen partial pressures under visible light irradiation”
S. Shimakawa, Y. Kamada, T. Kawaharamura, C. Li, S. Fujita, T. Hirao, and M. Furuta
Jpn. J. Appl. Phys., Vol.51 (2012) 03CB04 (4 pages) (10.1143/JJAP.51.03CB04)
“Control of Swelling Height of Si Crystal by Irradiating Ar Beam”
S. Momota, J. Zhang, T. Toyonaga, H. Terauchi, K. Maedam J. Taniguchi, T. Hirao, M. Furuta, and T. Kawaharamura
Journal of Nanoscience and Nanotechnology, Vol.12 (2012) pp.557-562. (10.1166/jnn.2012.5371)
- 2011年 - (7報)
“Influence of annealing under reducing ambient on properties of ZnO thin films prepared by mist CVD”
T. Kawaharamura, H. Orita, T. Shirahata, A Yoshida, S. Fujita, and T. Hirao
Physica Status Solidi (c), Vol.9 No.2 (2011) pp.190-193. (10.1002/pssc.201100281)
“Well-arrayed ZnO nanostructures formed by multi-annealing processes at low temperature”
Dapeng Wang, Zeming Li, Toshiyuki Kawaharamura, Mamoru Furuta, Tadashi Narusawa, Chaoyang Li
Physica Status Solidi (c), Vol.9 No.2 (2011) pp.194-197. (10.1002/pssc.201100271)
“Pulsed laser excitation power dependence of photoluminescence peak energies in bulk ZnO”
Giang T. Dang, Hiroshi Kanbe, Toshiyuki Kawaharamura, and Masafumi Taniwaki
J. Appl. Phys., Vol.110 (2011) 083508 (5 pages) (10.1063/1.3653273)
“Photocurrent and Persistent Photoconductivity in Zinc Oxide Thin-Film Transistors under UV-light Irradiation”
M. Furuta, Y. Kamada, M. Kimura, S. Shimakawa, T. Kawaharamura, D. Wang, C. Li, S. Fujita, and T. Hirao
Jpn. J. Appl. Phys., Vol.50 (2011) 110204 (3 pages) (10.1143/JJAP.50.110204)
“Study on Oxygen Source and Its Effect on Film Properties of ZnO Deposited by Radio Frequency Magnetron Sputtering”
Y. Kamada, M. Furuta, T. Hiramatsu, T. Kawaharamura, D. Wang, S. Shimakawa, C. Li, S. Fujita, and T. Hirao
Applied Surface Science, Vol.258 (2011) pp.695-699. (10.1016/j.apsusc.2011.07.100)
“Influence of Sputtering Pressure on Band Gap of Zn1-xMgxO Thin Film Prepared by Radio Frequency Magnetron Sputtering”
D. Wang, T. Narusawa, T. Kawaharamura, M. Furuta, and C. Li
Journal of Vacuum Science and Technology B, Vol.29 (2011) 051205 (4 pages) (10.1116/1.3622316)
“Photoluminescence, morphology, and structure of hydrothermal ZnO implanted at room temperature with 60 keV Sn+ ions”
Giang T. Dang, Toshiyuki Kawaharamura, Noriko Nitta, Hiroshi Kanbe, Takashi Hirao, and Masafumi Taniwaki
J. Appl. Phys., Vol.109 (2011) 123516 (5 pages) (10.1063/1.3598068)
- 2010年 - (5報)
“Crystal Structure Analysis of Multiwalled Carbon Nanotube Forests by Newly Developed Cross-Sectional X-ray Diffraction Measurement”
Hiroshi Furuta, Toshiyuki Kawaharamura, Mamoru Furuta, Katsumasa Kawabata, Takashi Hirao, Takuji Komukai, Kumiko Yoshihara, Yutaka Shimomoto, and Toshiyuki Oguchi
Appl. Phys. Express Vol.3 (2010) 105101 (3 pages) (10.1143/APEX.3.105101)
“High-Density Short-Height Directly Grown CNT Patterned Emitter on Glass”
H. Furuta, T. Kawaharamura, K. Kawabata, M. Furuta, T. Matsuda, C. Li and T. Hirao
e-Journal of Surface Science and Nanotechnology, Vol.8 (2010) pp.336-339. (10.1380/ejssnt.2010.336)
“Comparison of structural and photoluminescence properties of zinc oxide nanostructures influenced by gas ratio and substrate bias during radio frequency sputtering”
C. Li, T. Matsuda, T. Kawaharamura, H. Furuta, M. Furuta, T. Hiramatsu, T. Hirao, Y. Nakanishi and K. Ichinomiya
J. Vac. Sci. Technol. B, Vol. 28 (2010) C2B51 (5 pages) (10.1116/1.3271250)
“Effect of Pulsed Substrate Bias on Film Properties of SiO2 Deposited by Inductively Coupled Plasma Chemical Vapor Deposition”
T. Hiramatsu, T. Matsuda, H. Furuta, H. Nitta, T. Kawaharamura, C. Li, M. Furuta, and T. Hirao
Jpn. J. Appl. Phys., Vol.49 (2010) 03CA03 (4 pages) (10.1143/JJAP.49.03CA03)
“Effect of Surface Treatment of Gate-insulator on Uniformity in Bottom-gate ZnO Thin-film Transistors”
M. Furuta, T. Nakanishi, M. Kimura, T. Hiramatsu, T. Matsuda, T. Kawaharamura, H. Furuta, and T. Hirao
Electrochemical and Solid-State Letters, Vol.13 (2010) pp.H101-104. (10.1149/1.3290741)
- 2009年 - (1報)
“Intense green cathodoluminescence from low-temperature-deposited ZnO film with fluted hexagonal cone nanostructures”
Chaoyang Li, Toshiyuki Kawaharamura, Tokiyoshi Matsuda, Hiroshi Furuta, Takahiro Hiramatsu, Mamoru Furuta, and Takashi Hirao
Applied Physics Express, Vol.2 (2009) 091601 (3 pages) (10.1143/APEX.2.091601)
- 2008年 - (8報)
“Growth of crystalline zinc oxide thin films by fine channel mist chemical vapor deposition”
T. Kawaharamura, H. Nishinaka and S. Fujita
Jpn. J. Appl. Phys., Vol.47 (2008) pp.4669-4675 (10.1143/JJAP.47.4669)
“Mist CVD growth of ZnO-based thin films and nanostructures”
T. Kawaharamura, H. Nishinaka, Y. Kamada, Y. Masuda, J.-G. Lu and S. Fujita
J. Korean Physical Society, Vol.53 (2008) pp.2976-2980
“An approach of making single crystalline zinc oxide thin film with fine channel mist chemical vapor deposition method”
T. Kawaharamura and S. Fujita
Physica Status Solidi (c), Vol.5 (2008) pp.3138-3140 (10.1002/pssc.200779305)
「ミストCVD法の薄膜作製におけるファインチャネルおよび衝突混合の効果」
川原村敏幸, 西中浩之, 藤田静雄
材料, Vol.57 (2008) pp.481-487
“Junction properties of nitrogen-doped ZnO thin films”
J.-G. Lu, S. Fujita, T. Kawaharamura, H. Nishinaka, and Y. Kamada
Physica Status Solidi (c), Vol.5 (2008) pp.3088-3090 (10.1002/pssc.200779171)
“Second order optical effects in Au nanoparticle-deposited ZnO nanocrystallite films”
K. Ozga, T. Kawaharamura, A.A. Umar, M. Oyama, K. Nouneh, A. Slezak, S. Fujita, M. Piasecki, A.H. Reshak and I.V. Kityk
Nanotechnology, Vol.19 (2008) 185709 (6 pages) (10.1088/0957-4484/19/18/185709)
“Non-Linear Optical Effects in Au Nanoparticle-Deposited ZnO Nanocrystalline Films”
K. Ozga, T. Kawaharamura, A.A. Umar, M. Oyama, A. Slezak, S. Fujita, I.V. Kityk
J. Nano Research, Vol.2 (2008) pp.31-38 (10.4028/www.scientific.net/JNanoR.2.31)
“Growth of ZnO Nanostructures by Using Ultrasonic Spray Chemical Vapor Deposition with a Au Catalyst”
H. Nishinaka, T. Kawaharamura and S. Fujita
J. Korean Physical Society, Vol.53 (2008) pp.3025-3028
- 2007年 - (4報)
“ZnO-based thin films synthesized by atmospheric pressure mist chemical vapor deposition”
J.G. Lu, T. Kawaharamura, H. Nishinaka, Y. Kamada, T. Ohshima, S. Fujita
Journal of Crystal Growth, Vol.299 (2007) pp.1-10 (10.1016/j.jcrysgro.2006.10.251)
“Carrier concentration dependence of band gap shift in n-type ZnO:Al films”
J. G. Lu, S. Fujita, T. Kawaharamura, H. Nishinaka, Y. Kamada, T. Ohshima, Z. Z. Ye, Y. J. Zeng, Y. Z. Zhang, L. P. Zhu, H. P. He, and B. H. Zhao
Journal of Applied Physics, Vol.101 (2007) 083705 (7 pages) (10.1063/1.2721374)
“Roles of hydrogen and nitrogen in p-type doping of ZnO”
J.G. Lu, S. Fujita, T. Kawaharamura, H. Nishinaka
Chemical Physics Letters, Vol.441 (2007) pp.68-71 (10.1016/j.cplett.2007.04.085).
“Low-temperature growth of ZnO thin films by linear source ultrasonic spray chemical vapor deposition”
H. Nishinaka, T. Kawaharamura and S. Fujita
Japanese Journal of Applied Physics, Vol.46 (2007) pp.6811-6813 (10.1143/JJAP.46.6811)
- 2006年 - (3報)
「ファインチャネルミスト法によるZnO透明薄膜の作製とその特性」
川原村敏幸, 西中浩之, 亀谷圭介, 増田喜男, 谷垣昌敬, 藤田静雄
日本材料学会誌, Vol.55 No.2 (2006) pp.153-158
“Linear-source ultrasonic spray chemical vapor deposition method for fabrication of ZnMgO films and ultraviolet photodetectors”
Y. Kamada, T. Kawaharamura, H. Nishinaka and S. Fujita
Japanese Journal of Applied Physics, Vol.45 (2006) pp.L857-L859 (10.1143/JJAP.45.L857)
“Carrier concentrationinduced band-gap shift in Al-doped Zn1-xMgxO thin films”
J. G. Lu, S. Fujita, T. Kawaharamura, H. Nishinaka, Y. Kamada, and T. Ohshima
Applied Physics Letters, Vol.89 (2006) 262107 (3 pages) (10.1063/1.2424308)
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